Selective Growth of WSe2 with Graphene Contacts

Posted on 2020-03-13 - 04:57
Abstract Nanoelectronics of two-dimensional (2D) materials and related applications are hindered with critical contact issues with the semiconducting monolayers. To solve these issues, a fundamental challenge is selective and controllable fabrication of p-type or ambipolar transistors with a low Schottky barrier. Most p-type transistors are demonstrated with tungsten selenides (WSe2) but a high growth temperature is required. Here, we utilize seeding promoter and low pressure CVD process to enhance sequential WSe2 growth with a reduced growth temperature of 800 °C for reduced compositional fluctuations and high hetero-interface quality. Growth behavior of the sequential WSe2 growth at the edge of patterned graphene is discussed. With optimized growth conditions, high-quality interface of the laterally stitched WSe2-graphene is achieved and characterized with transmission electron microscopy (TEM). Device fabrication and electronic performances of the laterally stitched WSe2-graphene are presented.

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Lin, Yu-Ting; Zhang, Xin-Quan; Chen, Po-Han; Chi, Chong-Chi; Lin, Erh-Chen; Rong, Jian-Guo; et al. (2020): Selective Growth of WSe2 with Graphene Contacts. figshare. Collection. https://doi.org/10.6084/m9.figshare.c.4892670.v1
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Nanoscale Research Letters

AUTHORS (9)

Yu-Ting Lin
Xin-Quan Zhang
Po-Han Chen
Chong-Chi Chi
Erh-Chen Lin
Jian-Guo Rong
Chuenhou Ouyang
Yung-Fu Chen
Yi-Hsien Lee
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