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MOESM1 of Fabrication of device with poly(N-isopropylacrylamide)-b-ssDNA copolymer brush for resistivity study

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posted on 2017-10-05, 05:00 authored by Yi-Zu Liu, May-Show Chen, Chih-Chia Cheng, Shih-Hsun Chen, Jem-Kun Chen
Additional file 1: Figure S1. Thickness of (a) PN4, PN8, PN12, PN16 and PN20, and (b) PN4D, PN8D, PN12D, PN16D and PN20D plotted as a function of temperature.

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    Journal of Nanobiotechnology

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    Block copolymer brushSupramolecular complexResistivity

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