Additional file 1: of The Fabrication of Nanoimprinted P3HT Nanograting by Patterned ETFE Mold at Room Temperature and Its Application for Solar Cell

The cross-section SEM image of P3HT nanograting film bearing a width of ~130 nm and a period of ~280 nm. According to the fabrication process of nanoimprinted P3HT nanograting film, the highest aspect ratio of P3HT nanograting obtained (bearing a width of ~130 nm and a period of ~280 nm) is about 0.5. Here, we define the aspect ratio is the ratio value of height (L) to width (W) within nanograting. (DOC 186 kb)